电子束曝光剂量测试与剂量矩阵EBL dose testing and dose matrices

让每个试片位置对应剂量、图形和测量结果。Map each pilot location to dose, pattern and measurement.

适合什么需求Suitable projects

更换胶厚、材料栈或平台后，旧剂量是否可用，需要试片确认。本页面向 EBL 剂量标定、剂量矩阵试片及显影后关键尺寸评估的咨询；邻近效应校正的模型与数据交接见独立 PEC 专题。For EBL dose calibration, dose-matrix pilots and post-development dimensional assessment. Review an old dose when changing resist thickness, stack or facility. See the separate PEC guide for correction models and data handoff.

剂量矩阵测什么What a dose matrix tests

Minnesota Nano Center 的 CJob 指南介绍用重复图形阵列逐项改变曝光剂量，以寻找适合指定图形的条件。阵列位置与剂量更新顺序需要对应。[1] 微纳Hub建议交付一份位置—图形—剂量对照表，避免 SEM 结果与曝光条件错配。Minnesota Nano Center describes varying exposure dose across repeated patterns and selecting the dose-update order. [1] MN Fab Hub recommends a position–pattern–dose map so inspection results remain traceable.

清胶剂量与成形剂量分开验收Separate clearing and dimensional targets

关于 ZEP520A 与 mr-PosEBR 的研究分别评估清胶剂量、目标尺寸剂量和分辨率。[2] 因此本项目建议：正胶大面积开口是否清净，与细线/间隙是否达到目标尺寸分别记录；负胶则明确保留结构的判据。不能把一种测试块通过直接当作所有器件图形通过。A study of ZEP520A and mr-PosEBR evaluates dose to clear, dose to size and resolution separately. [2] Our project checklist therefore separates positive-resist clearing from fine-feature dimensions and defines retained-pattern criteria for negative resists. One test block does not qualify every device feature.

询价与送样资料Quotation and sample inputs

请提供基底及膜层、胶种/胶厚、样品尺寸数量、版图文件与单位、目标线宽/间隙、已有曝光显影记录和 SEM。补充试片可用面积、显影后或转移后的验收阶段、关键尺寸容差、希望比较的条件数及是否已有 PEC 或图形偏置。未知参数标为待确认。Provide substrate and films, resist and thickness, sample dimensions and quantity, layout and units, target widths and gaps, previous exposure/development records and SEM images. Add pilot area, acceptance stage, dimensional tolerances, number of conditions and any prior PEC or geometry bias. Mark unknowns for review.

试片设计与常见风险Pilot design and common risks

微纳Hub建议先由平台确定剂量范围和步进，试片包含实际器件代表图形，并保留重复点。每轮对比固定胶处理、显影和检测条件，记录束流与曝光设置，区分剂量变化、图形密度和位置差异。不直接套用其他设备或文献的剂量数值；具体试片方案由接收平台审核。MN Fab Hub recommends facility-defined dose ranges and increments, representative device patterns and repeat locations. Hold resist processing, development and inspection fixed within a comparison; record beam and exposure settings. Separate dose, pattern-density and position effects. Published or other-tool doses are not transferable recipes; the receiving facility reviews the pilot.

验收报告与下一步Report and next step

建议报告包含阵列坐标、名义剂量及单位、图形编号、实测尺寸、残胶/桥连/倒塌观察、测量方法和通过区间。若后续是刻蚀或 Lift-off，再约定转移后复测。报价区分版图整理、条件数量、曝光显影、检测与复测轮次；资料齐备后确认试片路线、周期与费用。The suggested report includes coordinates, nominal dose and units, pattern IDs, measured dimensions, residue/bridging/collapse observations, measurement method and passing interval. Agree post-transfer checks for etch or lift-off. Itemize layout preparation, conditions, exposure/development, inspection and iteration rounds before confirming schedule and cost.

官方资料Official references

核查日期：2026-09-15。平台资料用于说明用途与参数类别；本文项目清单为微纳Hub建议，具体能力由接收平台确认。Checked September 15, 2026. Facility references explain applications and parameter categories. Project checklists are MN Fab Hub suggestions; the receiving facility confirms capabilities.