原子层沉积Atomic layer deposition

通过分隔的、交替自限表面反应循环生长薄膜。Separated, alternating self-limiting surface reactions build a film through repeated cycles.

原理图解准备中Preparing the mechanism study

通过分隔的、交替自限表面反应循环生长薄膜。Atomic layer deposition

非等比例原理示意，不代表设备或加工能力。Not-to-scale explanation, not an equipment or capability claim.

关键区别Key distinction

一个循环不必然等于完整一个原子层；高深宽比覆盖也受输运与反应条件影响。One cycle need not form one complete atomic layer. High-aspect-ratio coverage remains dependent on transport and reaction conditions.

观察路径What to observe

前驱体 A 接触Precursor A exposure

表面位点逐渐被占据，饱和后不无限堆积。Surface sites become occupied and approach saturation.

清除多余前驱体Purge excess precursor

吹扫分隔反应物，保留表面吸附状态。Purging separates reactants while retaining surface species.

反应物 B 接触Reactant B exposure

第二次表面反应改变终止状态并形成材料。The second surface reaction changes termination and forms material.

再次吹扫，准备循环Purge and repeat

循环累积膜厚；一次循环不等于完整原子层。Cycles accumulate thickness; one cycle need not equal a full atomic layer.

项目输入Project inputs

表面成核、前驱体、循环、深宽比、热式或等离子体路线Nucleation, precursors, cycles, aspect ratio and thermal or plasma activation.
整理项目需求Prepare a project brief ↗

进一步阅读Further reading

动画为非等比例原理示意，粒子、颜色、光路及材料厚度为解释性表达，不是测量结果或设备参数。Animation is not to scale. Particles, colors, optical paths and thicknesses are explanatory, not measurement results or tool parameters.