沉积镀膜与生长Deposition & growth

蒸发镀膜 / PVDEvaporation / PVD

材料蒸发后到达可达表面,逐渐形成薄膜。Evaporated material reaches accessible surfaces and accumulates as a film.

在首页观看原理演示Watch the interactive study ↗

原理图解准备中Preparing the mechanism study

蒸发镀膜 / PVDEvaporation / PVD

材料蒸发后到达可达表面,逐渐形成薄膜。Evaporation / PVD

非等比例原理示意,不代表设备或加工能力。Not-to-scale explanation, not an equipment or capability claim.

关键区别Key distinction

PVD 是方法家族,包含蒸发与溅射;定向蒸发不能代替共形沉积。PVD is a family including evaporation and sputtering. Directional evaporation is not conformal growth.

项目输入Project inputs

膜材、膜厚、附着层、台阶覆盖与热预算Film material, thickness, adhesion layer, step coverage and thermal budget.
整理项目需求Prepare a project brief ↗

进一步阅读Further reading

相关技术专题Related technical topic ↗
Kurt J. Lesker:薄膜沉积技术 ↗

动画为非等比例原理示意,粒子、颜色、光路及材料厚度为解释性表达,不是测量结果或设备参数。Animation is not to scale. Particles, colors, optical paths and thicknesses are explanatory, not measurement results or tool parameters.