适合什么需求Good For
薄膜沉积前后粗糙度、刻蚀表面损伤、CMP 平坦化、二维材料与纳米结构形貌、微小台阶高度,以及工艺批次对比。Film roughness, etch damage, CMP planarization, 2D materials, nanostructures, small steps and lot comparison.
专业词入口Topic Entry
AFM 可用于薄膜与刻蚀表面的三维纳米形貌、Ra/Rq 粗糙度、颗粒和台阶高度分析。可靠验收不能只写“测一下 AFM”,还要固定测点、扫描尺寸、像素、滤波与数据交付口径。AFM measures nanoscale morphology, roughness, particles and step height; comparable results require fixed locations, scan size, sampling and analysis rules.
薄膜沉积前后粗糙度、刻蚀表面损伤、CMP 平坦化、二维材料与纳米结构形貌、微小台阶高度,以及工艺批次对比。Film roughness, etch damage, CMP planarization, 2D materials, nanostructures, small steps and lot comparison.
样品材料和尺寸、目标测点示意、扫描区域与数量、接触或轻敲模式、预期高度范围、Ra/Rq/Sa/Sq 口径、是否需要原始数据。Sample, locations, scan sizes, point count, contact or tapping mode, height range, roughness metrics and raw-data needs.
探针卷积导致横向尺寸失真、软样品被划伤、污染吸附、不同扫描尺度不可直接比较、倾斜校正或滤波改变粗糙度,以及测点代表性不足。Tip convolution, sample damage, contamination, incomparable scan scales, leveling or filtering bias and poor point representativeness.
推荐下一步Next Step
请提交样品照片、材料与表面处理、目标测点、扫描尺寸和数量、预期高度或粗糙度范围、统计指标、是否要截线轮廓与原始文件。微纳Hub 会先判断 AFM、轮廓仪、白光干涉或 SEM 哪种组合更合适。Share the sample, surface history, target locations, scan matrix, expected range, metrics and raw-data needs so AFM can be compared with profilometry, interferometry or SEM.
提交 AFM 测试需求Submit AFM request查看表征与测试导航Open metrology route