适合什么需求Good For
- SEM、光学显微、AFM、轮廓仪和椭偏SEM, optical microscopy, AFM, profilometry and ellipsometry
- 电学、光学、RF 测试和失效分析Electrical, optical, RF tests and failure analysis
- 需要把结果整理成下一轮工艺依据的项目Projects that need results converted into next-round process decisions
工艺小站 09Process Stop 09
适合 SEM、显微、轮廓、椭偏、电学、光学、RF 测试和失效分析。For SEM, optical imaging, profilometry, ellipsometry, electrical, optical, RF tests and failure analysis.
把这些说清楚,别人就不用隔空猜样品;报价和可行性也会靠谱很多。When these points are clear, nobody has to guess the sample from thin air; feasibility and quotes get much more reliable.
1. 项目目标:想做什么结构,用于什么测试或验证。1. Project goal: target structure and intended test or validation.
2. 材料与样品:衬底、膜层、尺寸、数量、来源和特殊处理限制。2. Material and sample: substrate, films, size, quantity, source and handling limits.
3. 版图与尺寸:GDS/截图、最小线宽/线距、面积、Layer/Cell 和对准要求。3. Layout and dimensions: GDS/screenshots, CD/space, area, Layer/Cell and alignment.
4. 工艺与验收:目标深度/膜厚、误差、检测方式、交付形式和期望时间。4. Process and acceptance: depth/thickness, tolerance, metrology, deliverables and schedule.