适合什么需求Good For
沉积膜厚、光刻胶厚度、刻蚀深度、微结构高度及工艺均匀性抽检；尤其适合已通过遮挡、刻蚀或 lift-off 制备清晰台阶的样品。Deposited-film or resist thickness, etch depth, structure height and uniformity checks with a defined step.
专业词入口Topic Entry
台阶仪测膜厚，先确认真实台阶、扫描方向与探针条件。Profilometer thickness measurement starts with a real step, scan direction and stylus conditions.
接触式台阶仪适合测量有明确高低平台的膜厚、刻蚀深度和表面轮廓。结果不仅取决于量程，也受台阶制备、探针力、扫描长度、倾斜校正、颗粒和软膜划伤风险影响。A stylus profilometer measures film steps, etch depth and surface profiles when the step geometry and scan settings are suitable.
需要准备什么Prepare First
样品材质与尺寸、台阶形成方式、预估高度、扫描方向/长度和测点图、软硬程度、允许探针力、重复次数，以及原始轮廓与统计表要求。Sample, step formation, expected height, scan direction and length, point map, hardness, stylus force, repeats and raw profiles.
常见风险Common Risks
没有真实台阶、台阶边缘残胶或毛刺、样品翘曲导致基线漂移、探针划伤软膜、颗粒造成假峰，以及把局部单线结果当成整片均匀性。Missing or dirty steps, bow-driven baseline drift, stylus damage, particle spikes and treating one trace as wafer uniformity.
推荐下一步Next Step
先用示意图标出台阶、扫描线与测点，再确认量程和验收。Mark the step, scan lines and sites before choosing range and acceptance.
请提交样品照片或版图、台阶来源、预估高度、扫描方向与测点数量，并说明是否需要多点统计、原始轮廓和基线处理记录。微纳Hub 会先判断台阶仪是否适用，或需改用椭偏、AFM、白光干涉或截面 SEM。Share the layout, step origin, expected height, scan plan and delivery needs so profilometry can be compared with ellipsometry, AFM, interferometry or cross-section SEM.
提交台阶仪测试需求Submit profilometer request查看表征与测试导航Open metrology route