工艺小站 01Process Stop 01

光刻与直写这件事Lithography & Direct Writing

适合电子束直写（EBL）、激光直写（LDW）、接触式紫外光刻（Contact UV）、步进式光刻机（Stepper）、深紫外光刻机（DUV）和套刻周期结构需求。For EBL, LDW, Contact UV, Stepper, DUV and overlay periodic-structure requirements.

发送需求邮件Send Request 看激光直写专题Open LDW Topic 看接触式光刻专题Open Contact UV Topic 看 DUV/Stepper 专题Open DUV Topic

适合什么需求Good For

电子束直写（EBL）、激光直写（LDW）、套刻或小批量图形验证EBL, LDW, overlay or small-batch pattern validation
接触式紫外光刻（Contact UV）、步进式光刻机（Stepper）或深紫外光刻机（DUV）路线判断Contact UV, Stepper or DUV route review
超表面、光栅、波导、电极窗口、周期阵列Metasurfaces, gratings, waveguides, electrode openings and arrays
需要判断线宽、周期、套刻、曝光面积和是否需要掩膜版的项目Projects that need CD, period, overlay, exposure-area and mask-need review

先准备什么Prepare First

GDS/DXF/PDF 或版图截图GDS/DXF/PDF files or layout screenshots
最小线宽、最小线距、周期和加工面积Minimum CD, spacing, period and exposure area
基底材料、膜层厚度、片源尺寸和数量Substrate, film thickness, sample size and quantity
是否需要套刻、mark、正/负胶或掩膜版Overlay, marks, positive/negative resist or mask needs

通常会找谁Who Usually Helps

电子束直写（EBL） / 激光直写（LDW）Electron-beam lithography (EBL) / Laser direct writing (LDW)
接触式紫外光刻（Contact UV） / 步进式光刻机（Stepper） / 深紫外光刻机（DUV）Contact UV lithography / Stepper lithography / Deep UV lithography (DUV)
掩膜版供应商、版图检查和曝光评估工艺公司Mask suppliers, layout-review and exposure-route process companies

先把这些说清楚What to Spell Out

把这些说清楚，别人就不用隔空猜样品；报价和可行性也会靠谱很多。When these points are clear, nobody has to guess the sample from thin air; feasibility and quotes get much more reliable.

GDS/版图截图GDS/Layout
版图类型/胶型Layout/Resist
最小线宽/线距CD/Space
套刻/markOverlay/Mark
加工面积Area

懒人邮件模板Quick Email Template

1. 项目目标：想做什么结构，用于什么测试或验证。1. Project goal: target structure and intended test or validation.

2. 材料与样品：衬底、膜层、尺寸、数量、来源和特殊处理限制。2. Material and sample: substrate, films, size, quantity, source and handling limits.

3. 版图与尺寸：GDS/截图、最小线宽/线距、面积、Layer/Cell 和对准要求。3. Layout and dimensions: GDS/screenshots, CD/space, area, Layer/Cell and alignment.

4. 工艺与验收：目标深度/膜厚、误差、检测方式、交付形式和期望时间。4. Process and acceptance: depth/thickness, tolerance, metrology, deliverables and schedule.

发送到 sunyvsheng@gmail.comEmail sunyvsheng@gmail.com 查看激光直写与光刻加工准备页Open LDW and lithography prep page 查看接触式光刻加工准备页Open contact UV prep page 查看 DUV/Stepper 光刻准备页Open DUV/Stepper prep page